Characterization of Metal-Oxide Nanofilm Morphologies and Composition by Terahertz Transmission Spectroscopy
Edwin J. Heilweil, James E. Maslar, William A. Kimes, Nabil Bassim, Peter K. Schenck
An all-optical terahertz absorption technique for non-destructive characterization of nanometer-scale metal-oxide thin films grown on silicon substrates is described. Example measurements of laser and atomic layer-deposited films of HfO2, TiO3, Al2O3 and VOx as a function of deposition conditions and film thickness are described. This technique is found to be sensitive to HfO2 phonon modes in films with 5 nm nominal thickness.
, Maslar, J.
, Kimes, W.
, Bassim, N.
and Schenck, P.
Characterization of Metal-Oxide Nanofilm Morphologies and Composition by Terahertz Transmission Spectroscopy, Optics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=842590
(Accessed December 2, 2023)