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Characterization of Metal-Oxide Nanofilm Morphologies and Composition by Terahertz Transmission Spectroscopy

Published

Author(s)

Edwin J. Heilweil, James E. Maslar, William A. Kimes, Nabil Bassim, Peter K. Schenck

Abstract

An all-optical terahertz absorption technique for non-destructive characterization of nanometer-scale metal-oxide thin films grown on silicon substrates is described. Example measurements of laser and atomic layer-deposited films of HfO2, TiO3, Al2O3 and VOx as a function of deposition conditions and film thickness are described. This technique is found to be sensitive to HfO2 phonon modes in films with 5 nm nominal thickness.
Citation
Optics Letters
Volume
34
Issue
No. 9

Keywords

nanometer films, metal oxides, terahertz, transmission spectroscopy, phonon modes, titanium oxide, hafnium oxide, far-infrared, morphology

Citation

Heilweil, E. , Maslar, J. , Kimes, W. , Bassim, N. and Schenck, P. (2009), Characterization of Metal-Oxide Nanofilm Morphologies and Composition by Terahertz Transmission Spectroscopy, Optics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=842590 (Accessed May 27, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created March 30, 2009, Updated January 27, 2020