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Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates



Joseph L. Tedesco, Walter Zheng, Oleg A. Kirillov, Sujitra J. Pookpanratana, Hyuk-Jae Jang, Premsagar P. Kavuri, Nhan V. Nguyen, Curt A. Richter
Proceedings of the IEEE


Resistive Switching, Sol-Gel, Thin Films, Flexible Substrates
Created December 7, 2011, Updated February 19, 2017