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Calibration of Phosphorus Implantation Dose in Silicon by Radiochemical Neutron Activation Analysis

Published

Author(s)

Rick L. Paul, David S. Simons
Citation
Silicon Front-End Junction Formation Technologies (Materials Research Society Symposia Proceedings)
Volume
717
Publisher Info
Materials Research Society , Warrendale, PA

Citation

Paul, R. and Simons, D. (2002), Calibration of Phosphorus Implantation Dose in Silicon by Radiochemical Neutron Activation Analysis, Materials Research Society , Warrendale, PA (Accessed July 23, 2024)

Issues

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Created August 1, 2002, Updated February 19, 2017