Paul, R.
and Simons, D.
(2002),
Calibration of Phosphorus Implantation Dose in Silicon by Radiochemical Neutron Activation Analysis, Materials Research Society , Warrendale, PA
(Accessed April 25, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Calibration of Phosphorus Implantation Dose in Silicon by Radiochemical Neutron Activation Analysis
Published
Author(s)
,
Citation
Silicon Front-End Junction Formation Technologies (Materials Research Society Symposia Proceedings)
Volume
717
Publisher Info
Materials Research Society , Warrendale, PA
Pub Type
Books
Citation
Created August 1, 2002, Updated February 19, 2017