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Breakdown Mechanism in Buried Silicon Oxide Films

Published

Author(s)

Santos D. Mayo, John S. Suehle, Peter Roitman
Citation
Journal of Applied Physics

Citation

Mayo, S. , Suehle, J. and Roitman, P. (1993), Breakdown Mechanism in Buried Silicon Oxide Films, Journal of Applied Physics (Accessed April 16, 2024)
Created August 31, 1993, Updated October 12, 2021