Mayo, S.
, Suehle, J.
and Roitman, P.
(1993),
Breakdown Mechanism in Buried Silicon Oxide Films, Journal of Applied Physics
(Accessed June 7, 2023)
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Breakdown Mechanism in Buried Silicon Oxide Films
Published
Author(s)
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Citation
Journal of Applied Physics
Pub Type
Journals
Citation
Created August 31, 1993, Updated October 12, 2021