Mayo, S.
, Suehle, J.
and Roitman, P.
(1993),
Breakdown Mechanism in Buried Silicon Oxide Films, Journal of Applied Physics
(Accessed May 4, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Breakdown Mechanism in Buried Silicon Oxide Films
Published
Author(s)
, ,
Citation
Journal of Applied Physics
Pub Type
Journals
Citation
Created August 31, 1993, Updated October 12, 2021