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Arsenic-induced Ge island morphology changes during molecular beam epitaxy of Ge on Si(001)
Published
Author(s)
B Liu, C L. Berrie, T Kitajima, S R. Leone
Citation
Journal of Crystal Growth
Volume
241
Pub Type
Journals
Citation
Liu, B.
, Berrie, C.
, Kitajima, T.
and Leone, S.
(2002),
Arsenic-induced Ge island morphology changes during molecular beam epitaxy of Ge on Si(001), Journal of Crystal Growth
(Accessed June 9, 2023)