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Angle-resolved Optical Metrology using Multi-Technique Nested Uncertainties



Richard M. Silver, Bryan M. Barnes, Hui Zhou, Nien F. Zhang, Ronald G. Dixson


This paper introduces recent advances in scatterfield microscopy using improved normalization and fitting procedures. Reduced measurement uncertainties are obtained through the use of more accurate normalization procedures in combination with better parametric fitting algorithms. A new approach to embed atomic force microscopy (AFM) or other reference metrology measurements directly in the uncertainty analysis and library-fitting process is used to reduce parametric uncertainties. We present both simulation results and experimental data demonstrating this new method, which is based on Bayesian analysis as applied to library-based regression.
Proceedings Title
SPIE Proc. Optical Metrology
Conference Dates
June 22-25, 2009
Conference Location


scatterfield microscopy, Köhler illuminated, bright field microscope, Angle and polarization resolved illumination, reference metrology, angle-resolved scatterfield


Silver, R. , Barnes, B. , Zhou, H. , Zhang, N. and Dixson, R. (2009), Angle-resolved Optical Metrology using Multi-Technique Nested Uncertainties, SPIE Proc. Optical Metrology , Munich, -1 (Accessed July 15, 2024)


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Created August 15, 2009, Updated February 19, 2017