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An Accurate Value for the Absorption Coefficient of Silicon at 633 nm

Published

Author(s)

Jon Geist, A. R. Schaefer, J-F. Song, Y. H. Wang, E. F. Zalewski
Citation
Journal of Research (NIST JRES) -

Citation

Geist, J. , Schaefer, A. , Song, J. , Wang, Y. and Zalewski, E. (1990), An Accurate Value for the Absorption Coefficient of Silicon at 633 nm, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD (Accessed April 14, 2024)
Created October 29, 1990, Updated October 12, 2021