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3-D Optical Metrology of Finite sub-20nm Dense Arrays With sub-nanometer Parametric Uncertainties

Published

Author(s)

Jing Qin, Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, Richard M. Silver

Abstract

A new approach that involves parametric fitting of 3-D scattered field with electromagnetic simulation, Fourier domain normalization, and uncertainties analysis is presented to rigorously analyze 3-D through-focus optical images of targets that scatter a continuum of frequency components
Proceedings Title
OSA Technical Digests
Conference Dates
June 24-28, 2013
Conference Location
Alexandria, VA
Conference Title
Applied Industrial Optics: Spectroscopy, Imaging, and Metrology (AIO)

Keywords

optical metrology, parametric fitting

Citation

Qin, J. , Zhou, H. , Barnes, B. , Dixson, R. and Silver, R. (2013), 3-D Optical Metrology of Finite sub-20nm Dense Arrays With sub-nanometer Parametric Uncertainties, OSA Technical Digests, Alexandria, VA, [online], https://doi.org/10.1364/AOPT.2013.JTu4A.32 (Accessed May 26, 2024)

Issues

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Created June 23, 2013, Updated November 10, 2018