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193 nm Angle-Resolved Scatterfield Microscope for Semiconductor Metrology

Published

Author(s)

Martin Y. Sohn, Richard Quintanilha, Bryan M. Barnes, Richard M. Silver

Abstract

An angle-resolved scatterfield microscope (ARSM( feating 193 nm excimer laser light wa developed for measuring critical dimension (CD) and overlay of nanoscale targets as used in semiconductor metrology. The microscope is designed to have a wide and telecentric conjugate back focal plane (CBFP) and a scan module for resolving Kohler illumination in the sample plane. Angular scanning of the sample plane was achieved by linearly scanning an aperture across the 12 mm diameter CBFP, with aperture size as small as 0.4 mm for some scans. For each aperture, the sample was illuminated over a range of angles from 12-48 degrees, corresponding to a numerical aperture of 0.2 to 0.74. Angle-resolved measurement results are presented for grating targets with nominal linewidths down to 50 nm.
Proceedings Title
Proceedings SPIE Optics & Photonics
Volume
7405
Conference Dates
August 5-7, 2009
Conference Location
San Diego, CA

Keywords

angle resolved, conjugate back focal plane, illumination, scatterfield microscopy

Citation

Sohn, M. , Quintanilha, R. , Barnes, B. and Silver, R. (2009), 193 nm Angle-Resolved Scatterfield Microscope for Semiconductor Metrology, Proceedings SPIE Optics & Photonics, San Diego, CA (Accessed June 18, 2024)

Issues

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Created August 24, 2009, Updated February 19, 2017