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James E. Maslar, William A. Kimes, Vladimir B. Khromchenko, Brent Sperling, Ravindra Kanjolia
Low volatility precursors are widely utilized in chemical vapor deposition and atomic layer deposition processes. Such precursors are often delivered from one
Christina Cecelski, Kimberly Harris, Cassie Goodman, William A. Kimes, Philip Liu, Walter R. Miller Jr., Jennifer Carney
The Gas Sensing Metrology Group at NIST provides accurate, stable gaseous standards for use in various types of emissions testing and environmental monitoring
James E. Maslar, William A. Kimes, Brent A. Sperling, Ravindra K. Kanjolia
Low volatility precursors are widely utilized in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. Compared to gases and high
James E. Maslar, William A. Kimes, Brent A. Sperling, Ravindra K. Kanjolia
A non-dispersive infrared (NDIR) gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition
James E. Maslar, William A. Kimes, Brent A. Sperling, Ravindra K. Kanjolia
The performance of a bubbler to deliver the low-volatility, liquid cobalt precursor μ2- η2-(tBu- acetylene) dicobalthexacarbonyl (CCTBA) for reduced-pressure