B.S. Mechanical Engineering – Worcester Polytechnic Institute
M.S. Materials Engineering – Worcester Polytechnic Institute
Ph.D. Materials Science and Engineering – University of Florida
Kerry Siebein is a Physical Scientist in the NanoFab Operations Group. She received a B.S. in Mechanical Engineering and an M.S. in Materials Engineering from the Worcester Polytechnic Institute, and a Ph.D. in Materials Science and Engineering from the University of Florida. Kerry has extensive experience using transmission electron microscopy, scanning electron microscopy, and x-ray diffraction to analyze microstructural property relationships in a wide range of materials. Prior to joining the CNST, she managed the transmission electron microscopy and scanning electron microscopy laboratories at the Major Analytical Instrumentation Center at the University of Florida. She also taught the graduate level TEM course, and trained and assisted graduate students and faculty with their research projects. Kerry is responsible for training NanoFab users and for operating the focused ion beam systems, scanning electron microscopes, x-ray diffraction, atomic force microscope and the transmission electron microscope in the NanoFab.
- Characterization of lanthanum zirconate formation at the A-site-deficient strontium-doped lanthanum manganite cathode/yttrium-stabilized zirconia electrolyte interface of solid oxide fuel cells, A. Chen, G. Bourne, K. Siebein, R. DeHoff, E. Wachsman, and K. Jones, Journal of the American Ceramic Society 91, 2670-2675 (2008).
- Grain boundary chemistry of SiC-based armor, E. Pabit, K. Siebein, D. P. Butt, H. Heinrich, D. Ray, S. Kaur, R. M. Flinders, and R. A. Cutler, in Advances in Ceramic Armor II: Ceramic Engineering and Science Proceedings (John Wiley & Sons, Inc., 2008), p. 69-84.
- Surface and bulk thermal annealing effects on ZnO crystals, W. Lim, V. Craciun, K. Siebein, B. P. Gila, D. P. Norton, S. J. Pearton, and F. Ren, Applied Surface Science 254, 2396-2400 (2008).
- Synthesis of graded HF--silicate thin films for alternate gate dielectric applications, K. Ramani, P. Kumar, K. Siebein, V. Craciun, and R. K. Singh, Electrochemical and Solid-State Letters 10, H66-H68 (2007).