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Daniel Sunday, Peter Dudenas, Priyanka Ketkar, Julia Murphy, Cherno Jaye, Regis Kline, Gurpreet Singh, Eungnak Han, Lauren Doyle, Florian Gstrein
Photoresist patterning for semiconductor manufacturing is encountering new challenges with the move the extreme ultraviolet (EUV) lithography, driven by smaller...
Lee Richter, Daniel Sunday, Lucas Flagg, Julia Murphy, Peter Beaucage, Eliot Gann, Ruipeng Li
Blending block copolymers (BCP) with additives is a useful approach for controlling BCP morphology and properties. In athermal systems blends of BCPs with...
Bijal Patel, Hongbo Feng, Whitney Loo, Chad R. Snyder, Christopher Eom, Julia Murphy, Daniel Sunday, Paul Nealey, Dean DeLongchamp
Hierarchical structure-within-structure assemblies offer a route toward increasingly complex and multifunctional materials while pushing the limits of block...