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Jonathan Wyrick (Fed)

Physicist

Jonathan Wyrick is an experimental physicist at the National Institute of Standards and Technology (NIST) in the Atom Scale Device Group. He performs fundamental research developing the chemical physics of bottom-up fabricated artificial structures embedded in silicon. The four technical thrusts of this work are: 1) artificial molecules constructed from silicon dangling bonds and their interactions with deposited atoms/molecules, 2) low temperature atom/molecule manipulation with a scanning tunneling microscope (STM), 3) automation and semi-automation of atomic manipulation and lithography techniques for atom scale device fabrication, and 4) specialized in situ measurements for characterization of atom/molecule-based devices. Jonathan graduated from the University of California, Riverside with a Ph.D. in Physics and received two undergraduate degrees: the first in Mathematics and Computer Science from Furman University, and the second in Physics from James Madison University.

Publications

Electron-electron interactions in low-dimensional Si:P delta layers

Author(s)
Joseph Hagmann, Xiqiao Wang, Ranjit Kashid, Pradeep Namboodiri, Jonathan Wyrick, Scott W. Schmucker, Michael Stewart, Richard M. Silver, Curt A. Richter
Key to producing quantum computing devices based on the atomistic placement of dopants in silicon by scanning tunneling microscope (STM) lithography is the

Atomic-scale control of tunneling in donor-based devices

Author(s)
Xiqiao Wang, Jonathan E. Wyrick, Ranjit V. Kashid, Pradeep N. Namboodiri, Scott W. Schmucker, Andrew Murphy, Michael D. Stewart, Richard M. Silver
Atomically precise donor-based quantum devices are a promising candidate for scalable solid- state quantum computing. Atomically precise design and
Created March 9, 2019, Updated January 20, 2022