Joe Bennett is a research chemist in the Materials Measurement Science Division at the National Institute of Standards and Technology. He received a bachelor's degree in chemistry from Jamestown College before earning a Ph.D in Analytical Chemistry from Texas A&M University. Joe started at NIST in 1989 as a postdoctoral researcher, becoming a staff member in 1990. His research interests focused on the application of secondary ion mass spectrometry (SIMS) to organic materials characterization and surface analysis. In 1994 Joe left NIST to join the semiconductor manufacturing consortium SEMATECH, where he applied SIMS to the qualitative and quantitative analysis of materials relevant to the semiconductor industry. His interests included ultra-shallow dopant profiling, ultra-thin film analysis, and high spatial resolution chemical analysis. In 2008 Joe became manager of the Process Characterization Labs for SVTC, leading staff scientists and technicians in a for-profit analytical services laboratory using advanced materials analysis (AFM, Auger, SIMS, TXRF, XPS) and microscopy (FIB, SEM, TEM) techniques. In 2014 Joe returned to NIST. His current research interests include continued development of SIMS methods for analysis of both organic and inorganic materials, application of ambient ionization mass spectrometry (AI-MS) to detection of trace contraband material, and characterization of materials and processes associated with additive manufacturing (3D printing). Joe is active in the SIMS community and has served as a trustee for the Annual Workshop on SIMS and co-chaired the 11th International Conference on SIMS.