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Aaron Chew (Fed)

Publications

Ellipsometry in the EUV Regime

Author(s)
Aaron Chew, Bryan Barnes, Eric Shirley, Thomas Germer
We propose and analyze the sensitivity of an ellipsometer that uses extreme ultraviolet (EUV) light from the synchrotron SURF-III. The ellipsometer employs a

Lab-based multi-wavelength EUV diffractometry for critical dimension metrology

Author(s)
Bryan Barnes, Aaron Chew, Nicholas Jenkins, Yunzhe Shao, Martin Sohn, Regis Kline, Daniel Sunday, Purnima Balakrishnan, Thomas Germer, Steven Grantham, Clay Klein, Stephanie Moffitt, Eric Shirley, Henry Kapteyn, MARGARET MURNANE
Background: The industry is developing extreme-ultraviolet wavelength (EUV) techniques to measure critical dimensions (CDs) in logic fabrication. As nascent
View more Publications
Created July 3, 2024
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