Assessing Fabrication Tolerances for a Multilayer 2D Binary Grating for 3D Multifocus Microscopy

Published

May 2, 2016

Author(s)

Marcelo I. Davanco, Liya Yu, Lei Chen, Vincent K. Luciani, James A. Liddle

Abstract

We perform a comprehensive theoretical assessment of fabrication tolerances for a 2D eight-level binary phase grating that is the central element of a multi-focal plane 3D microscopy apparatus. The fabrication process encompasses a sequence of aligned lithography and etching steps with stringent requirements on layer-to-layer overlay, etch depth and etched sidewall slope, which we show are nonetheless achievable with state-of-the-art optical lithography and etching tools. We also perform broadband spectroscopic diffraction pattern measurements on a fabricated grating, and show how such measurements can be valuable in determining small fabrication errors in diffractive optical elements.

Citation

Optics Express

Volume

24

Issue

9

Pub Type

Journals

Download Paper

https://doi.org/10.1364/OE.24.009224

Keywords

Diffractive optics, Three-dimensional fabrication , Binary optics

Citation

Davanco, M. , Yu, L. , Chen, L. , Luciani, V. and Liddle, J. (2016), Assessing Fabrication Tolerances for a Multilayer 2D Binary Grating for 3D Multifocus Microscopy, Optics Express, [online], https://doi.org/10.1364/OE.24.009224 (Accessed April 17, 2024)