Jarrett, D.
, Payagala, S.
, Kraft, M.
and Yu, K.
(2016),
Third Generation of Adapted Wheatstone Bridge for High Resistance Measurements at NIST, CPEM 2016 Conference Digest, Ottawa, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920066
(Accessed October 15, 2025)
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Third Generation of Adapted Wheatstone Bridge for High Resistance Measurements at NIST
Published
Author(s)
, Shamith Payagala, , Kwang Min Yu
Abstract
A third generation of adapted Wheatstone bridge is being developed at NIST to improve high resistance measurements and scaling from 1 TΩ to 10 PΩ. Improvements to extend range and reduce uncertainties include automated calibration of the voltage sources, modified bridge balancing algorithm, low-noise shielded cables, and software migration to a modern programming environment. Initial measurements agree well within the expanded uncertainties (k = 2) of the second generation NIST adapted Wheatstone bridge.Proceedings Title
CPEM 2016 Conference Digest
Conference Dates
July 10-15, 2016
Conference Location
Ottawa, CA
Conference Title
Conference on Precision Electromagnetic Measurements (CPEM)2016
Pub Type
Conferences
Download Paper
Keywords
adapted Wheatstone bridge, calibration, high resistance, standard resistor, voltage source
Citation
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Created July 10, 2016, Updated April 4, 2022