Zhang, N.
, Postek, M.
and Larrabee, R.
(1996),
Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments, Metrologia
(Accessed May 31, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments
Published
Author(s)
, ,
Abstract
The measurement of pitch in metrology instruments is through to be a benign self-compensating function. In the course of issuing the new scanning electron microscope standard SRM 2090, a new algorithm for the measurement of pitch was developed. This is based on linear regression models. For a pitch measurement, a regression line is traditionally fitted to each edge of the data independently, then the distance between some arbitrary threshold on that line is determined. The new algorithm eliminates the need for a threshold. An evaluation of uncertainty of the measurement process is also described.Citation
Metrologia
Volume
34
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created December 31, 1995, Updated October 12, 2021