Jach, T.
, Bakulin, A.
, Durbin, S.
, Pedulla, J.
and Macrander, A.
(2008),
Variable Magnification of Kirkpatrick-Baez Optics for Xynchrotron X-Ray Absorption Microscopy, Applied Optics
(Accessed April 19, 2024)
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Variable Magnification of Kirkpatrick-Baez Optics for Xynchrotron X-Ray Absorption Microscopy
Published
Author(s)
, A S. Bakulin, S M. Durbin, , A T. Macrander
Abstract
Hard x-ray imaging microscopy using multilayer-coated Kirkpatrick-Baez mirrors produces absorption images with one micron resolution or better when used with a low-divergence synchrotron source. Because the incident x-ray beam nearly corresponds to an ideal plane-wave source, the usual optical description of the K-B optics must be modified. It is found that image formation is no longer governed by the lens maker s law, the image quality is nearly independent of the object distance from the optics, and the magnification increases linearly as the image plane is further removed from the optics. This surprising flexibility of the image formation, along with high resolution, good field of view, and greatly improved image acquisition time, suggests new opportunities for synchrotron x-ray absorption microscopy.Citation
Applied Optics
Pub Type
Journals
Keywords
Kirkpatrick-Baez, microscope, multilayer, x-ray optics
Citation
Created October 16, 2008