Gallagher, A.
(2001),
Some Physics and Chemistry of Hot-Wire Deposition, Thin Solid Films (Accessed May 3, 2026)
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Some Physics and Chemistry of Hot-Wire Deposition
Published
Author(s)
Alan Gallagher
Abstract
Although hot-wire chemical vapor deposition (HWCVD) involves far fewer species than plasma enhanced CVD, I have used some physics and chemistry in the title because less is known than unknown regarding the hot-wire deposition processes, in even pure silane. I will concentrate on intrinsic a-Si:H deposition from SiH4/H2 vapors, since this is the simplest and most studied system, and it has considerable practical importance. I will start with the reactions on the hot wire, a metal filament, then discuss the radical-vapor reactions and finally the surface reactions that produce the film and its properties. This no a review, and I will not attempt to cover all work that has been done to elucidate these processes.Citation
Thin Solid Films
Pub Type
Journals
Keywords
film inhomogeneities, hot-wire deposition
Citation
Issues
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Created July 1, 2001, Updated February 17, 2017