Exposure of Self-Assembled Monolayers to Highly Charged Ions and Metastable Ions

Published

July 1, 1999

Author(s)

L P. Ratliff, Ronaldo Minniti, A Bard, E W. Bell, John D. Gillaspy, D Parks, A J. Black, G M. Whitesides

Abstract

The doses of neutral metastable argon atoms (Ar*) and highly charged xenon ions (HCIs) required to damage self-assembled monolayers (SAMs) of alkanethiolates on gold are compared in a set of experiments carried out concurrently. The extent of damage to the SAM is determined by developing the samples in a gold etching solution, then measuring the decrease in reflectivity of the gold; {approximately} 10⁵ Ar* are required to cause the same amount of damage as 1 HCI, as measured by this assay. We have also demonstrated HCI micropatterning of a surface using a physical mask, suggesting the application of this system in lithography.

Citation

Applied Physics Letters

Volume

75

Issue

No. 4

Pub Type

Journals

Keywords

dose, highly charged ions, metastable ions, patterning, self-assembled monolayers, surface

Citation

Ratliff, L. , Minniti, R. , Bard, A. , Bell, E. , Gillaspy, J. , Parks, D. , Black, A. and Whitesides, G. (1999), Exposure of Self-Assembled Monolayers to Highly Charged Ions and Metastable Ions, Applied Physics Letters (Accessed May 18, 2024)