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PUBLICATIONS

Simple, Compact, High-Purity Cr Evaporator for UHV

Published

Author(s)

Jabez J. McClelland, John Unguris, R E. Scholten, Daniel T. Pierce

Abstract

A simple, compact Cr evaporator is constructed by electroplating Cr metal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min-1 (flux {asymp} 1019 atoms m-2s-1) have been obtained, with total deposition thickness in excess of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum show impurities below detectability.
Citation
Journal of Vacuum Science and Technology A
Volume
11
Issue
5
Pub Type
Journals
Metrology

Citation

McClelland, J. , Unguris, J. , Scholten, R. and Pierce, D. (1993), Simple, Compact, High-Purity Cr Evaporator for UHV, Journal of Vacuum Science and Technology A (Accessed October 8, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created September 1, 1993, Updated February 19, 2017
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