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Lithography With Self-Assembled Copolymer Microdomains

Published

Author(s)

C Harrison, John A. Dagata, P Adamson

Abstract

There are many research groups working on copolymer lithography;many more have expressed interest in joining the field.Researchers who are new to this area will find the broad reviewof copolymer thin films by Fasolka and Mayes to be a highlyvaluable resource. However, to thisresearcher's knowledge, no comprehensive review of copolymerlithography currently exists. Therefore, we undertake one suchreview here which will enable lithography researchers to quicklycome up to speed.
Citation
Developments in Block Copolymer Science and Technology

Keywords

copolymer, lithography, self-assembling

Citation

Harrison, C. , Dagata, J. and Adamson, P. (2004), Lithography With Self-Assembled Copolymer Microdomains, Developments in Block Copolymer Science and Technology (Accessed November 6, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 1, 2004, Updated February 17, 2017
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