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Colliding Self-Assembly Waves in Organosilane Monolayers
Author(s)
K Efimenko, Ali Ozcam, Jan Genzer, Daniel A. Fischer, Frederick R. Phelan Jr., Jack F. Douglas
Abstract
Colliding autocatalytic wave-fronts of organosilane (OS) layer self-assembly are generated through the controlled positioning of sources of the volatile OS material at the edges of a silica wafer and through adjustment of the container dimensions in which the wafer-source system is placed. The concentration profiles and molecular orientation of the OSs of colliding wave-fronts are assessed by means of combinatorial near-edge x-ray absorption fine structure (NEXAFS) spectroscopy. For systems involving waves made of the same OS precursor (homogeneous systems), the shapes and positions of both fronts on the surface are centro-symmetrical. In contrast, heterogeneous systems, involving OSs having different chemistries and head-groups, exhibit highly non-symmetrical concentration profiles on the substrate. We discuss effects relevant to understanding these wave-front collision phenomena.
Efimenko, K.
, Ozcam, A.
, Genzer, J.
, Fischer, D.
, Phelan, F.
and Douglas, J.
(1970),
Colliding Self-Assembly Waves in Organosilane Monolayers, Wiley, New York, NY
(Accessed April 19, 2024)