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An Improved Fast I d -V ^d g Measurement Technology With Expanded Application Range
Published
Author(s)
Chen Wang, Liangchun (. Yu, Jason P. Campbell, Kin P. Cheung, Yi Xuan, Peide Ye, John S. Suehle, David Zhang
Abstract
Fast Id-Vg measurements on very high performance devices (very low channel ON-resistance) and larger area devices (therefore large gate capacitance) are subject to serious distortions. Methods to minimize these distortions are introduced in this paper; thus expanding the applicable range of this important measurement technique.
Proceedings Title
2009 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP
Wang, C.
, Yu, L.
, Campbell, J.
, Cheung, K.
, Xuan, Y.
, Ye, P.
, Suehle, J.
and Zhang, D.
(2009),
An Improved Fast I<sub> d </sub>-V ^d g Measurement Technology With Expanded Application Range, 2009 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP
, Reno, NV, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=904155
(Accessed October 2, 2025)