Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device

Published

February 9, 2011

Author(s)

Kathryn L. Beers, Michael J. Fasolka, Julie N. Albert, Timothy D. Bogart, Ronald L. Lewis, J. Brian Hutchison, Bryan D. Vogt, Thomas H. Epps

Abstract

Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using the device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

Citation

Nano Letters

Volume

11

Issue

3

Pub Type

Journals

Download Paper

https://doi.org/10.1021/nl104496r

Keywords

gradients, solvent vapor annealing, block copolymer, thin film, self-assembly, microfluidic, mixing tree, nanostructure

Citation

Beers, K. , Fasolka, M. , Albert, J. , Bogart, T. , Lewis, R. , , J. , Vogt, B. and Epps, T. (2011), Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device, Nano Letters, [online], https://doi.org/10.1021/nl104496r (Accessed October 7, 2025)