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PUBLICATIONS

High-energy Ultra-Small Angle X-ray Scattering Instrument at the Advanced Photon Source

Published

Author(s)

Andrew J. Allen, Lyle E. Levine, Fan Zhang, Gabrielle G. Long, Jan Ilavsky, Pete R. Jemian

Abstract

This paper reports recent tests performed on the Bonse-Hart-type ultra-small angle X-ray scattering (USAXS) instrument at the Advanced Photon Source with higher-order reflection optics — Si (440) instead of Si (220) — and with X-ray energies greater than 21.0 keV. Our results demonstrate the feasibility of high-energy operation with narrower crystal reflectivity curves, which provides access to a scattering vector range from ≈ 2 × 10-5 to 1.8 Å-1 and up to 12 decades in the associated sample dependent scattering intensity range. The corresponding size range of the scattering features spans about 5 decades – from less than 1 Å to ≈ 30 μm. These tests have indicated that mechanical upgrades are required to ensure the alignment capability and operational stability of this instrument for general user operations due to the tighter angular-resolution constraints of the higher-order crystal optics. These upgrades are now underway.
Citation
Journal of Applied Crystallography
Volume
45
Pub Type
Journals

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Keywords

Bonse-Hart ultra-small-angle X-ray scattering instrument, USAXS, Ultra-high SAXS resolution
Materials, Ceramics, Materials characterization, Composition and structure, Polymers and Nanomaterials

Citation

Allen, A. , Levine, L. , Zhang, F. , Long, G. , Ilavsky, J. and Jemian, P. (2012), High-energy Ultra-Small Angle X-ray Scattering Instrument at the Advanced Photon Source, Journal of Applied Crystallography, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=911966 (Accessed October 20, 2025)

Issues

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Created December 1, 2012, Updated February 19, 2017
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