There has been much recent work in developing advanced optical metrology methods that use imaging optics for critical dimension measurements and defect detection. Sensitivity to nanometer scale changes has been observed when measuring critical dimensions of sub-wavelength 20 nm features or when imaging defects below 15 nm using angle-resolved and focus-resolved optical data. However, these methods inherently involve complex imaging optics and analysis of complicated three-dimensional electromagnetic fields. This paper develops a new approach to enable the rigorous analysis of three-dimensional, through-focus or angle-resolved optical images. We use rigorous electromagnetic simulation, optical tool normalization, and statistical methods to evaluate sensitivities and uncertainties in the measurement of three dimensional structures.
Citation: Applied Optics
Pub Type: Journals
Optical metrology, electromagnetic simulation, evaluate sensitivities and uncertainties, phase sensitive measurements, through-focus three-dimensional field