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Aaron Chew (Fed)

Publications

Harnessing the extreme ultraviolet for critical dimension metrology

Author(s)
Bryan Barnes, Purnima P. Balakrishnan, John Burnett, Aaron Chew, Colton Dudley, Thomas Germer, Steven Grantham, Stephanie Moffitt, Eric Shirley, Martin Sohn, Daniel Sunday
The semiconductor industry has long adopted visible and ultraviolet wavelengths for optical critical dimension (OCD) measurements. Decreasing feature sizes...

Lab-based multi-wavelength EUV diffractometry for critical dimension metrology

Author(s)
Bryan Barnes, Aaron Chew, Nicholas Jenkins, Yunzhe Shao, Martin Sohn, Regis Kline, Daniel Sunday, Purnima Balakrishnan, Thomas Germer, Steven Grantham, Clay Klein, Stephanie Moffitt, Eric Shirley, Henry Kapteyn, MARGARET MURNANE
Background: The industry is developing extreme-ultraviolet wavelength (EUV) techniques to measure critical dimensions (CDs) in logic fabrication. As nascent...

Ellipsometry in the EUV Regime

Author(s)
Aaron Chew, Bryan Barnes, Eric Shirley, Thomas Germer
We propose and analyze the sensitivity of an ellipsometer that uses extreme ultraviolet (EUV) light from the synchrotron SURF-III. The ellipsometer employs a...
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Data and Software Publications

Lab-based multi-wavelength EUV diffractometry for critical dimension metrology

Author(s)
Bryan M Barnes, Aaron Chew, Nicholas W Jenkins, Yunzhe Shao, Martin Y Sohn, R Joseph Kline, Daniel F Sunday, Purnima P Balakrishnan, Thomas A Germer, Steven E Grantham, Clay Klein, Stephanie L Moffitt, Eric A Shirley, Henry C Kapteyn, Margaret M Murnane
This data set provides the measurement data from EUV diffractometry, simulated fits to these data, and parametric values and uncertainties from these fits as first reported in Barnes et al., "Lab
Created July 3, 2024
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