NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Low barrier height in a ZnO nanorods/NbSe2 heterostructure prepared by van der Waals epitaxy
Published
Author(s)
Yeonhoo Kim, Roxanne Tutchton, Ren Liu, Sergiy Krylyuk, Jian-Xin Zhu, Albert Davydov, Young Joon Hong, Jinkyoung Yoo
Abstract
Two-dimensional (2D) materials as contacts for semiconductor devices have attracted great attention due to minimizing Fermi level pinning. Schottky–Mott physics has been widely employed to design 2D material-based electrodes and to elucidate their contact behavior. In this study, we revealed that charge transfer across a 2D/semiconductor heterointerface and materials characteristics besides work function should be accounted for in fabrication of electrodes based on 2D materials. Our density function theory (DFT) calculations predicted that charge transfer between ZnO and NbSe2 lowers barrier height at the heterojunction and that surface states of ZnO provide an additional conduction channel in the ZnO/NbSe2 heterostructures. Electrical characterizations of the ZnO/NbSe2 heterostructures showed Ohmic-like behavior as predicted by the DFT calculations, opposed to the prediction based on the Schottky–Mott model.
Kim, Y.
, Tutchton, R.
, Liu, R.
, Krylyuk, S.
, Zhu, J.
, Davydov, A.
, Hong, Y.
and Yoo, J.
(2021),
Low barrier height in a ZnO nanorods/NbSe2 heterostructure prepared by van der Waals epitaxy, APL Materials, [online], https://doi.org/10.1063/5.0052596, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=932518
(Accessed October 12, 2025)