Optimizing Subfield Targets for Nanoscale Quantitative Optical Imaging

Published

September 29, 2016

Author(s)

Mark Alexander Henn, Bryan M. Barnes, Hui Zhou, Martin Y. Sohn, Richard M. Silver

Abstract

The full 3-D scattered field above finite sets of features has been shown to contain a continuum of spatial frequency information, and with novel optical microscopy techniques and electromagnetic modeling, deep-subwavelength geometrical parameters can be determined. Similarly, by using simulations, scattering geometries and experimental conditions can be established to tailor scattered fields that yield lower parametric uncertainties while decreasing the number of measurements and the area of such finite sets of features. Such optimized conditions are reported through quantitative optical imaging in 193 nm scatterfield microscopy using feature sets up to four times smaller in area than state-of-the-art critical dimension targets.

Citation

Optics Letters

Pub Type

Journals

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Keywords

optical metrology, electromagnetic simulation, normalized sensitivities, parametric uncertainties, phase sensitive measurements, through-focus three-dimensional field

Citation

, M. , Barnes, B. , Zhou, H. , Sohn, M. and Silver, R. (2016), Optimizing Subfield Targets for Nanoscale Quantitative Optical Imaging, Optics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920818 (Accessed October 11, 2025)