The two Sandvik oxidation furnaces, equipped with silicon carbide tubes, support oxidation processing in the NanoFab. The oxidation furnaces support thermal wet (pyrogenic) and dry oxidations, and oxidation with Trans-LC on substrates ranging from small chips to wafer diameters up to 200 mm. All samples require SC1 and SC2 cleans prior to processing.
Automatic recipe controller using Variable Parameter Table (VPT).
Maximum Temperature: 1200 °C
Thermal wet (pyrogenic) oxidation
Thermal dry oxidation
Thermal oxidation with Trans-LC
Wafer diameters: 75 mm (3 in), 100 mm (4 in), 150 mm (6 in), and 200 mm (8 in)