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NanoFab Tool: Sandvik Anneal Furnaces

Sandvik Anneal Furnaces
Credit: NIST

Photo of the Sandvik anneal furnaces

The two Sandvik anneal furnaces, equipped with silicon carbide tubes, support anneal processing in the NanoFab. The anneal furnaces allow nitrogen, argon and forming gas anneals on substrates ranging from small chips to wafer diameters up to 200 mm.


  • Automatic recipe controller using Variable Parameter Table (VPT)
  • Maximum Temperature: 1200 °C  
  • Standard anneal processes gases:
    • Nitrogen
    • Argon
    • 10% forming gas
  • Wafer diameters: 75 mm (3 in), 100 mm (4 in), 150 mm (6 in), and 200 mm (8 in)
  • Small pieces supported: Yes

Typical Applications

  • Dopant diffusion/activation
  • Crystallization
  • Densification of deposited films
  • Sinter
  • Anneal
Created April 10, 2019, Updated December 4, 2019