The two Sandvik anneal furnaces, equipped with silicon carbide tubes, support anneal processing in the NanoFab. The anneal furnaces allow nitrogen, argon and forming gas anneals on substrates ranging from small chips to wafer diameters up to 200 mm.
Automatic recipe controller using Variable Parameter Table (VPT)
Maximum Temperature: 1200 °C
Standard anneal processes gases:
10% forming gas
Wafer diameters: 75 mm (3 in), 100 mm (4 in), 150 mm (6 in), and 200 mm (8 in)