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NanoFab Tool: Reynolds Tech Silicon Etch Wet Bench

Photograph of the Reynolds Tech silicon etch wet bench.

The Reynolds Tech silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process is used to form windows in silicon for fabricating membranes and to shape silicon parts for microelectromechanical systems. The bench can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.

Specifications/Capabilities

  • 45 % KOH dip tank with a lid.
  • Heated DI water dip tank with a lid.
  • HCl dip tank with a lid.
  • Dump rinse with a lid.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: Yes.

Typical Applications

  • Nitride membrane formation.
  • Microelectromechanical systems.
Created June 19, 2014, Updated December 4, 2019