NanoFab Tool: J. A. Woollam M-2000 DI Spectroscopic Ellipsometer
The J. A. Woollam M-2000 DI spectroscopic ellipsometer provides fast and accurate thin film characterization over a wide spectroscopic range. The high speed CCD detector automatically collects data at hundreds of wavelengths ranging from infrared to deep ultraviolet at multiple angles. The user-friendly modeling software can analyze the collected data to characterize film thicknesses, indices of refraction, and extinction coefficients on single layer or multilayer film stacks.
Automated X-Y sample translation.
Automated tip and tilt alignment.
Automated sample height alignment.
Automated angle adjustment ranging from 45° to 90°.
Wavelength range: 193 nm to 1690 nm.
Minimum measurement beam diameter: 300 µm using focusing probes.
High speed charge-coupled device (CCD) detector.
Integrated camera for viewing the measurement light beam's location.
User friendly software for data acquisition and data analysis.
Supported Sample Sizes
Maximum wafer diameter: 200 mm (8 in).
Small pieces supported: Yes.
Maximum thickness: 5 mm.
Characterization of thin films.
Measurement of thickness and optical constants on single or multilayer stack.
Characterization of oxides, photoresists, nitrides, polymers, metals, and other thin films.
Mapping of film uniformity.
Determination of deposition rates, etch rates, and total film growth.