Skip to main content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.


The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

NanoFab Tool: J. A. Woollam M-2000 DI Spectroscopic Ellipsometer

Photograph of the J. A. Woollam M-2000 DI spectroscopic ellipsometer.
Photograph of the J. A. Woollam M-2000 DI spectroscopic ellipsometer.

The J. A. Woollam M-2000 DI spectroscopic ellipsometer provides fast and accurate thin film characterization over a wide spectroscopic range. The high speed CCD detector automatically collects data at hundreds of wavelengths ranging from infrared to deep ultraviolet at multiple angles. The user-friendly modeling software can analyze the collected data to characterize film thicknesses, indices of refraction, and extinction coefficients on single layer or multilayer film stacks.


  • Automated X-Y sample translation.
  • Automated tip and tilt alignment.
  • Automated sample height alignment.
  • Automated angle adjustment ranging from 45° to 90°.
  • Wavelength range: 193 nm to 1690 nm.
  • Minimum measurement beam diameter: 300 µm using focusing probes.
  • High speed charge-coupled device (CCD) detector.
  • Integrated camera for viewing the measurement light beam's location.
  • User friendly software for data acquisition and data analysis.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: Yes.
  • Maximum thickness: 5 mm.

Typical Applications

  • Characterization of thin films.
  • Measurement of thickness and optical constants on single or multilayer stack.
  • Characterization of oxides, photoresists, nitrides, polymers, metals, and other thin films.
  • Mapping of film uniformity.
  • Determination of deposition rates, etch rates, and total film growth.
Created May 21, 2014, Updated November 25, 2019