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NanoFab Tool: J. A. Woollam M-2000 DI Spectroscopic Ellipsometer

Photograph of the J. A. Woollam M-2000 DI spectroscopic ellipsometer.
Photograph of the J. A. Woollam M-2000 DI spectroscopic ellipsometer.

The J. A. Woollam M-2000 DI spectroscopic ellipsometer provides fast and accurate thin film characterization over a wide spectroscopic range. The high speed CCD detector automatically collects data at hundreds of wavelengths ranging from infrared to deep ultraviolet at multiple angles. The user-friendly modeling software can analyze the collected data to characterize film thicknesses, indices of refraction, and extinction coefficients on single layer or multilayer film stacks.

Specifications/Capabilities

  • Automated X-Y sample translation.
  • Automated tip and tilt alignment.
  • Automated sample height alignment.
  • Automated angle adjustment ranging from 45° to 90°.
  • Wavelength range: 193 nm to 1690 nm.
  • Minimum measurement beam diameter: 300 µm using focusing probes.
  • High speed charge-coupled device (CCD) detector.
  • Integrated camera for viewing the measurement light beam's location.
  • User friendly software for data acquisition and data analysis.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: Yes.
  • Maximum thickness: 5 mm.

Typical Applications

  • Characterization of thin films.
  • Measurement of thickness and optical constants on single or multilayer stack.
  • Characterization of oxides, photoresists, nitrides, polymers, metals, and other thin films.
  • Mapping of film uniformity.
  • Determination of deposition rates, etch rates, and total film growth.
Created May 21, 2014, Updated November 9, 2020