Sansonetti, C.
and Reader, J.
(2001),
Wavelength Characterization of a Molecular F2 Laser at 157 nm for DUV Lithography, Lambda Highlights
(Accessed May 5, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Wavelength Characterization of a Molecular F2 Laser at 157 nm for DUV Lithography
Published
Author(s)
,
Abstract
The wavelengths of six spectral lines emitted by a molecular fluorine (F2) laser at 157 nm were measured to high accuracy with the 10.7-m normal-incidence vacuum spectrograph at the National Institute of Standards and Technology. Lines from a Pt/Ne hollow cathode lamp served as wavelength standards. Spectra of the laser and the Pt/Ne lamp were photographed simultaneously through an uncoated CaF2 beam splitter. The optical paths were arranged so as to avoid shifts in line positions arising from possible differences in illumination of the grating by the two sources. The strongest lasing line was found to have a wavelength of 157.63094(10) nm. Changes in wavelength for variations in gas mixture, total gas pressure, and voltage were also measured.Citation
Lambda Highlights
Volume
No. 58
Pub Type
Others
Keywords
laser, line-width, microlithography, molecular fluorine, Pt/Ne Hollow Cathode Lamp, wavelengths
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created May 1, 2001, Updated February 19, 2017