Li, Y.
, Hummon, M.
, Schima, S.
, Kitching, J.
and SOHN, D.
(2024),
Wafer-scale fabrication of evacuated alkali vapor cells, Optics Letters, [online], https://doi.org/10.1364/OL.527351, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=957651
(Accessed October 13, 2025)
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Wafer-scale fabrication of evacuated alkali vapor cells
Published
Author(s)
, , , , DONGGYU SOHN
Abstract
We describe a process for fabricating a wafer-scale array of alkali metal vapor cells with low residual gas pressure. We show that by etching long, thin channels between the cells on the Si wafer surface, the residual gas pressure in the evacuated vapor cell can be reduced to below 0.5 kPa (4 Torr) with a yield above 50 %. The low residual gas pressure in these mass-producible alkali vapor cells can enable a new generation of low-cost chip-scale atomic devices such as vapor cell optical clocks, wavelength references, and Rydberg sensors.Citation
Optics Letters
Volume
49
Issue
17
Pub Type
Journals
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Created August 28, 2024, Updated February 11, 2025