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Wafer-Level Filling of Microfabricated Atomic Vapor Cells Based on Thin-Film Deposition and Photolysis of Cesium Azide

Published

Author(s)

Li-Anne Liew, John M. Moreland, V Gerginov

Abstract

The thin-film deposition and photodecomposition of cesium azide are demonstrated and used to fill arrays of miniaturized atomic resonance cells with cesium and nitrogen buffer gas for chip-scale atomic-based instruments. Arrays of silicon cells are batch fabricated on a wafer into which cesium azide is deposited by vacuum thermal evaporation. After vacuum sealing, the cells are then irradiated with ultraviolet radiation, causing the azide is photodissociate into pure cesium and nitrogen in-situ. This technology integrates the vapor-cell fabrication and filling procedures into one continuous and wafer-level parallel process, and results in cells that are optically transparent and chemically pure.
Citation
Applied Physics Letters
Volume
90

Keywords

atomic clock, azide, cesium, microfabrication, vapor cell

Citation

Liew, L. , Moreland, J. and Gerginov, V. (2007), Wafer-Level Filling of Microfabricated Atomic Vapor Cells Based on Thin-Film Deposition and Photolysis of Cesium Azide, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32542 (Accessed May 24, 2024)

Issues

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Created March 14, 2007, Updated October 12, 2021