Variable Magnification With Kirkpatrick-Baez Optics for Synchrotron X-Ray Microscopy

Published

May 1, 2006

Author(s)

Terrence J. Jach, A S. Bakulin, S M. Durbin, J Pedulla, A T. Macrander

Abstract

We describe the distinction between the operation of a short focal lengthx-ray microscope forming a real image with a laboratory source (convergentillumination) and with a highly collimated intense beam from a synchrotronlight source (K\{o}hler illumination). We demonstrate the distinction witha Kirkpatrick-Baez microscope consisting of short focal length multilayermirrors operating at an energy of 8 keV. In addition to realizingimprovements in the resolution of the optics, the synchrotron radiation microscope is not limited to the usual single magnification at a fixed image plane. Higher magnification images are produced by projection in the limit of geometrical optics with a collimated beam. The ultimate limits of this magnificationresult from diffraction by the specimen and are determined by thesample position relative to the focal point of the optic. We presentcriteria by which the diffraction is minimized.

Citation

Journal of Research (NIST JRES) -

Volume

111 No. 3

NIST Pub Series

Journal of Research (NIST JRES)

Pub Type

NIST Pubs

Keywords

diffraction limit, Kirkpatrick-Baez, microscopy, multilayer mirror, x-ray optics

Citation

Jach, T. , Bakulin, A. , Durbin, S. , Pedulla, J. and Macrander, A. (2006), Variable Magnification With Kirkpatrick-Baez Optics for Synchrotron X-Ray Microscopy, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD (Accessed October 14, 2025)