Fahey, K.
, Dunne, P.
, McKinney, L.
, O'Sullivan, G.
, Sokell, E.
, White, J.
, Aguilar-Mendoza, A.
, Pomeroy, J.
, Tan, J.
, Blagojevic, B.
, LeBigot, E.
and Gillaspy, J.
(2004),
UTA versus Line Emission for EUVL: Studies on Xenon Emission at the NIST EBIT, Journal of Physics D-Applied Physics
(Accessed April 19, 2024)
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UTA versus Line Emission for EUVL: Studies on Xenon Emission at the NIST EBIT
Published
Author(s)
K Fahey, P Dunne, L McKinney, G O'Sullivan, E Sokell, J White, , , , , E O. LeBigot,
Citation
Journal of Physics D-Applied Physics
Volume
37 No. 23
Pub Type
Journals
Keywords
EBIT, Electron Beam Ion Trap, EUV, lithography, model benchmarking, Xe spectroscopy
Citation
Created November 30, 2004, Updated October 12, 2021