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PUBLICATIONS

UTA versus Line Emission for EUVL: Studies on Xenon Emission at the NIST EBIT

Published

Author(s)

K Fahey, P Dunne, L McKinney, G O'Sullivan, E Sokell, J White, Alejando Aguilar-Mendoza, Joshua M. Pomeroy, Joseph N. Tan, B Blagojevic, E O. LeBigot, John D. Gillaspy
Citation
Journal of Physics D-Applied Physics
Volume
37 No. 23
Pub Type
Journals

Keywords

EBIT, Electron Beam Ion Trap, EUV, lithography, model benchmarking, Xe spectroscopy

Citation

Fahey, K. , Dunne, P. , McKinney, L. , O'Sullivan, G. , Sokell, E. , White, J. , Aguilar-Mendoza, A. , Pomeroy, J. , Tan, J. , Blagojevic, B. , LeBigot, E. and Gillaspy, J. (2004), UTA versus Line Emission for EUVL: Studies on Xenon Emission at the NIST EBIT, Journal of Physics D-Applied Physics (Accessed October 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created November 30, 2004, Updated October 12, 2021