Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

UTA versus Line Emission for EUVL: Studies on Xenon Emission at the NIST EBIT

Published

Author(s)

K Fahey, P Dunne, L McKinney, G O'Sullivan, E Sokell, J White, Alejando Aguilar-Mendoza, Joshua M. Pomeroy, Joseph N. Tan, B Blagojevic, E O. LeBigot, John D. Gillaspy
Citation
Journal of Physics D-Applied Physics
Volume
37 No. 23

Keywords

EBIT, Electron Beam Ion Trap, EUV, lithography, model benchmarking, Xe spectroscopy

Citation

Fahey, K. , Dunne, P. , McKinney, L. , O'Sullivan, G. , Sokell, E. , White, J. , Aguilar-Mendoza, A. , Pomeroy, J. , Tan, J. , Blagojevic, B. , LeBigot, E. and Gillaspy, J. (2004), UTA versus Line Emission for EUVL: Studies on Xenon Emission at the NIST EBIT, Journal of Physics D-Applied Physics (Accessed May 28, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created November 30, 2004, Updated October 12, 2021