NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Using Chemical Vapor Deposition Precursor Chemistry to Template Nanostructured Vanadium Oxide for Chemical Sensing
Published
Author(s)
S Y. Lee, Anna Mebust, Adam Chaimowitz, Casey Davis-VanAtta, Muhammad Afridi, Charles Taylor
Abstract
We demonstrate the preparation of selective nanostructured vanadium oxide chemical sensors using chemical vapor deposition precursor chemistry to control film microstructure. The origins of the response selectivity may be traced back to the nature of the bonding in the chemical precursors used for preparing the sensing films. We provide examples of sensing response to 1-propanol and nitrogen dioxide, each a reaction product in the formation of one of the materials.
Lee, S.
, Mebust, A.
, Chaimowitz, A.
, Davis-VanAtta, C.
, Afridi, M.
and Taylor, C.
(2010),
Using Chemical Vapor Deposition Precursor Chemistry to Template Nanostructured Vanadium Oxide for Chemical Sensing, Nano Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=33205
(Accessed October 13, 2025)