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USAXS-Analysis of Electron-Beam Physical Vapour Deposited Thermal Barrier Coatings and Application of Void Structure Modelling to Determine the Influence of Process Parameters on the Thermal Conductivity

Published

Author(s)

A Flores Renteria, B Saruhan, J Ilavsky, Andrew J. Allen
Citation
Surface and Coatings Technology

Keywords

electron beam phyaical vapor deposition, microstructure characterization, small angle x-ray scattering, thermal conductivity, tthermal barrier coatings

Citation

Flores Renteria, A. , Saruhan, B. , Ilavsky, J. and Allen, A. (2021), USAXS-Analysis of Electron-Beam Physical Vapour Deposited Thermal Barrier Coatings and Application of Void Structure Modelling to Determine the Influence of Process Parameters on the Thermal Conductivity, Surface and Coatings Technology (Accessed August 16, 2022)
Created October 12, 2021