Trace water vapor analysis in specialty gases: sensor and spectroscopic approaches

Published

July 1, 2013

Author(s)

Kristine A. Bertness, Mark W. Raynor, Kevin C. Cossel, Florian B. Adler, Jun Ye

Abstract

The analysis of water vapor impurity is important in a number of specialty gas applications. However the main driver for the development and advancement of trace H²O analysis techniques has been the microelectronics industry. The International Technology Roadmap for Semiconductors (ITRS) details the gas purity requirements for various wafer fabrication processes on their web-site (www.itrs.net). Oxygenated contaminants such as water vapor in the materials used and in the wafer environment are primary causes of defects and process variations that compromise yield. Since even trace levels of water in the process gases can seriously decrease device performance, analytical techniques must be capable of detecting water vapor from ppmv concentrations down to the low and even sub-ppbv range. This chapter focuses on technologies that not only provide high sensitivity for H²O but can also be applied to a wide range of specialty gases. They can be broadly categorized into sensor and spectroscopic-based approaches. Aspects related to water standards and calibration, are also discussed.

Citation

Trace Analysis of Specialty and Electronic Gases

Publisher Info

Wiley Inc., Hoboken, NJ

Pub Type

Books

Download Paper

https://doi.org/10.1002/9781118642771.ch7

Keywords

Gas analysis, gas spectroscopy, Impurity analysis

Citation

Bertness, K. , Raynor, M. , Cossel, K. , Adler, F. and Ye, J. (2013), Trace water vapor analysis in specialty gases: sensor and spectroscopic approaches, Wiley Inc., Hoboken, NJ, [online], https://doi.org/10.1002/9781118642771.ch7 (Accessed December 3, 2024)