Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Towards superconductivity in p-type delta-doped Si/Al/Si heterostructures

Published

Author(s)

Aruna N. Ramanayaka, Hyun Soo Kim, Joseph A. Hagmann, Roy E. Murray, Ke Tang, Neil M. Zimmerman, Curt A. Richter, Joshua M. Pomeroy, Frederick Meisenkothen, Huairuo Zhang, Albert Davydov, Leonid A. Bendersky

Abstract

In pursuit of superconductivity in p-type silicon (Si), we are using a single atomic layer of aluminum (Al) sandwiched between a Si substrate and a thin Si epi-layer. The delta layer was fabricated starting from an ultra high vacuum (UHV) flash anneal of Si(100) surface, followed by physical vapor deposition of Al monolayer. To activate the Al dopants, the sample was then annealed in-situ at 550 °C for 1 min. The Si capping layer was electron-beam evaporated in-situ at room temperature, followed by an ex-situ anneal at 550 °C for 10 min to recrystallize the Si capping layer. Low temperature magnetotransport measurements yield a maximum hole mobility of 20 cm2/V/s at a carrier density 1.39 × 10^14 holes/cm2, which corresponds to ≈ (0.93 ± 0.1) holes per dopant atom. No superconductivity was observed in these devices even at T
Citation
AIP Advances
Volume
8

Keywords

2DHG, quantum information, semiconductor quantum information

Citation

Ramanayaka, A. , , H. , Hagmann, J. , Murray, R. , Tang, K. , Zimmerman, N. , Richter, C. , Pomeroy, J. , Meisenkothen, F. , Zhang, H. , Davydov, A. and Bendersky, L. (2018), Towards superconductivity in p-type delta-doped Si/Al/Si heterostructures, AIP Advances, [online], https://doi.org/10.1063/1.5045338 (Accessed August 8, 2022)
Created July 30, 2018, Updated November 10, 2018