Suehle, J.
and Chaparala, P.
(1995),
Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO<sub>2</sub> Films, Proc., Materials Research Society Symposium, Pittsburgh, PA, USA
(Accessed May 11, 2025)
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Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO2 Films
Published
Author(s)
, P Chaparala
Proceedings Title
Proc., Materials Research Society Symposium
Conference Location
Pittsburgh, PA, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1995, Updated October 12, 2021