Suehle, J.
and Chaparala, P.
(1995),
Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO<sub>2</sub> Films, Proc., Materials Research Society Symposium, Pittsburgh, PA, USA
(Accessed October 9, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO2 Films
Published
Author(s)
, P Chaparala
Proceedings Title
Proc., Materials Research Society Symposium
Conference Location
Pittsburgh, PA, USA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 30, 1995, Updated October 12, 2021