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Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO2 Films

Published

Author(s)

John S. Suehle, P Chaparala
Proceedings Title
Proc., Materials Research Society Symposium
Conference Location
Pittsburgh, PA, USA

Citation

Suehle, J. and Chaparala, P. (1995), Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO<sub>2</sub> Films, Proc., Materials Research Society Symposium, Pittsburgh, PA, USA (Accessed June 22, 2024)

Issues

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Created December 30, 1995, Updated October 12, 2021