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Telepresence: A New Paradigm for Industrial and Scientific Collaboration

Published

Author(s)

Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec

Abstract

The successful development of a collaboratory for Telepresence Microscopy (TPM) provides an important new tool to promote technology transfer in the areas of measurement technology. NIST and Texas Instruments (TI), under the auspices of the National Automated Manufacturing Testbed (NAMT) and in collaboration with the University of Illinois (UIC) and Argonne National Laboratory (ANL) have developed a collaboratory testbed to demonstrate the value of TPM within organizations having a large distributed manufacturing facility such as Texas Instruments and between scientific research organizations such as NIST, ANL, and UIC. Large distributed manufacturing sites such as TI need rapid response when problems threaten to disrupt multi-million dollar production facilities. This is particularly important when expertise needed to solve the problem or instrumentation is not locally present. The resulting delays are inevitable and often costly. Telepresence minimizes these delays.
Proceedings Title
Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIII, Bhanwar Singh, Editor
Volume
3677
Conference Dates
March 15, 1999
Conference Location
Santa Clara, CA, USA
Conference Title
New Technology/New Approaches To Metrology

Keywords

analytical, collaboratory, internet, scanning electron microscope, telepresence, transmission electron microscope

Citation

Postek, M. , Bennett, M. and Zaluzec, N. (1999), Telepresence: A New Paradigm for Industrial and Scientific Collaboration, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIII, Bhanwar Singh, Editor, Santa Clara, CA, USA (Accessed May 25, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created May 31, 1999, Updated October 12, 2021