Lin, Y.
, Puthenkovilakam, R.
, Chang, J.
, Bouldin, C.
, Levin, I.
, Nguyen, N.
, Sun, Y.
, Pianetta, P.
, Conard, T.
, Vandervorst, W.
, Venturo, V.
and Selbrede, S.
(2021),
Tailoring the High-K Gate Dielectric/Sillicon Interface for CMOS Applications, Applied Physics
(Accessed October 8, 2024)