@article{796771,
  author = {Y Lin and R Puthenkovilakam and J Chang and C Bouldin and Igor Levin and Nhan Nguyen and Y Sun and P Pianetta and T Conard and W Vandervorst and V Venturo and S Selbrede},
  title = {Tailoring the High-K Gate Dielectric/Sillicon Interface for CMOS Applications},
  year = {2021},
  month = {2021-10-12 15:10:23},
  publisher = {Applied Physics},
  language = {en},
}