Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Structural Properties of Bi2Te3 and Bi2Se3 Topological Insulators Grown by Molecular Beam Epitaxy on GaAs(001) Substrates

Published

Author(s)

X. Liu, D. J. Smith, J. Fan, Y.-H. Zhang, H. Cao, Y. P. Chen, J. Leiner, Brian Kirby, M. Dobrowolska, J. K. Furdyna

Abstract

Thin films of Bi2Te3 and Bi2Se3 have been grown on deoxidized GaAs(100) substrates using molecular beam epitaxy. Cross-sectional transmission electron microscopy established the highly parallel nature of the Bi-Te(Se)-Bi-Te(Se)-Bi quintuple layers despite the slightly wavy GaAs substrate and the different crystal symmetries of the two materials. Raman mapping confirmed the presence of the strong characteristic peaks reported previously for these materials in bulk form. The overall quality of these films emphasizes the potential for future applications combining topological insulators with ferromagnetic semiconductors.
Citation
Applied Physics Letters
Volume
99
Issue
17

Keywords

topological insulators, magnetic semiconductors

Citation

Liu, X. , Smith, D. , Fan, J. , Zhang, Y. , Cao, H. , Chen, Y. , Leiner, J. , Kirby, B. , Dobrowolska, M. and Furdyna, J. (2011), Structural Properties of Bi<sub>2</sub>Te<sub>3</sub> and Bi<sub>2</sub>Se<sub>3</sub> Topological Insulators Grown by Molecular Beam Epitaxy on GaAs(001) Substrates, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=909092 (Accessed December 4, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 23, 2011, Updated October 12, 2021