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Structural and Magnetic Properties of Electrodeposited Co/Cu Multilayers

Published

Author(s)

M Shima, L Salamanca-Riba, Thomas P. Moffat, Robert D. McMichael

Abstract

A series of [Co(x ML)/Cu(17 ML)]100 multilayers were electrodeposited on Si(0 0 1) substrates covered with Cu seed layers. Magnetic hysteresis loops for lms with x 2 ML have sigmoidal shapes and the temperature dependence indicates a superparamagnetic behavior of the ultrathin Co layers. This behavior appears to be due to a discontinuity of the Co layers in the multilayer structure. In contrast, lms with x 2ML have rectangular loops. In-plane four-fold symmetry is observed for x 4ML, which re ects the magnetocrystalline anisotropy of the multilayers. The giant magnetoresistance e ect is observed for x 2ML.
Citation
Journal of Magnetism and Magnetic Materials
Volume
198-199

Keywords

magnetic properties

Citation

Shima, M. , Salamanca-Riba, L. , Moffat, T. and McMichael, R. (1999), Structural and Magnetic Properties of Electrodeposited Co/Cu Multilayers, Journal of Magnetism and Magnetic Materials (Accessed May 30, 2024)

Issues

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Created March 1, 1999, Updated February 17, 2017