Shima, M.
, Salamanca-Riba, L.
, Moffat, T.
and McMichael, R.
(1999),
Structural and Magnetic Properties of Electrodeposited Co/Cu Multilayers, Journal of Magnetism and Magnetic Materials (Accessed May 13, 2026)
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Structural and Magnetic Properties of Electrodeposited Co/Cu Multilayers
Published
Author(s)
, L Salamanca-Riba, ,
Abstract
A series of [Co(x ML)/Cu(17 ML)]100 multilayers were electrodeposited on Si(0 0 1) substrates covered with Cu seed layers. Magnetic hysteresis loops for lms with x 2 ML have sigmoidal shapes and the temperature dependence indicates a superparamagnetic behavior of the ultrathin Co layers. This behavior appears to be due to a discontinuity of the Co layers in the multilayer structure. In contrast, lms with x 2ML have rectangular loops. In-plane four-fold symmetry is observed for x 4ML, which re ects the magnetocrystalline anisotropy of the multilayers. The giant magnetoresistance e ect is observed for x 2ML.Citation
Journal of Magnetism and Magnetic Materials
Volume
198-199
Pub Type
Journals
Keywords
magnetic properties
Citation
Issues
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Created March 1, 1999, Updated February 17, 2017